Dresden, Germany

Johannes Kowalewski


Average Co-Inventor Count = 5.3

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2006

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2 patents (USPTO):

Title: **Johannes Kowalewski: Innovator in Semiconductor Production**

Introduction

Johannes Kowalewski, an accomplished inventor based in Dresden, Germany, has made significant contributions to the field of semiconductor technology. With a total of two patents to his name, Kowalewski's innovations focus primarily on improving processes involved in wafer production.

Latest Patents

Kowalewski’s notable inventions include a **Method for Production of Contacts on a Wafer** and a **Mark Configuration for Lithographic Exposure**. The first patent addresses the complexities of contact production on a wafer by introducing a lithographic process that utilizes a novel strip structure extending over two layers. This design minimizes the intricacies associated with point/hole lithography while enhancing efficiency. The second patent details a mark configuration which facilitates the precise alignment of multiple planes within a substrate during lithographic exposure, crucial for the production of DRAMs. This invention aims to maintain high contrast in mark structures, irrespective of varying design or processing conditions.

Career Highlights

As a dedicated innovator, Kowalewski is currently associated with Infineon Technologies AG. His expertise has positioned him at the forefront of semiconductor advancements, contributing to the ever-evolving landscape of technology.

Collaborations

Throughout his career, Kowalewski has worked alongside esteemed colleagues such as Werner Graf and Henning Haffner. These collaborations have further enhanced the technological innovations emerging from Infineon Technologies AG, fostering a culture of teamwork and shared expertise.

Conclusion

Johannes Kowalewski stands out as a key figure in the semiconductor industry, and his patents reflect his commitment to innovation. His work not only improves current technologies but also paves the way for future advancements. Through his contributions, Kowalewski continues to inspire both fellow inventors and upcoming engineers in the field.

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