Munich, Germany

Johannes Grübler

This inventor holds 1 USPTO granted patent and 2 EPO patents. Top assignee: Singulus Technologies Ag. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Johannes Grübler. Retrieved from https://idiyas.com/inventor/johannes-grübler

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Johannes Grübler: Innovator in Vapor Technology

Introduction

Johannes Grübler is a notable inventor based in Munich, Germany. He has made significant contributions to the field of vapor technology, particularly through his innovative patent. His work has implications for various industrial processes, showcasing his expertise and creativity.

Latest Patents

Grübler holds a patent titled "Process and device for providing vapor." This invention is directed towards a method and apparatus designed to provide vapor for a discontinuous process. His innovative approach addresses the need for efficient vapor generation in various applications.

Career Highlights

Throughout his career, Johannes Grübler has worked with prominent companies such as Singulus Technologies AG and Fraunhofer-Gesellschaft zur Förderung der Angewandten Forschung e.V. His experience in these organizations has allowed him to refine his skills and contribute to significant advancements in technology.

Collaborations

Grübler has collaborated with talented individuals in his field, including Oliver Hohn and Michael Reising. These partnerships have fostered a creative environment that has led to the development of innovative solutions in vapor technology.

Conclusion

Johannes Grübler is a distinguished inventor whose work in vapor technology has made a lasting impact. His patent and collaborations reflect his commitment to innovation and excellence in his field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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