This inventor holds 6 USPTO granted patents and 3 published patent applications and 22 EPO patents. Top assignee: Sick Ag. Active years: 2017-2021.
Company Filing History:
Years Active: 2017-2021
Title: Innovations of Johannes Eble
Introduction
Johannes Eble is a notable inventor based in Waldkirch, Germany. He has made significant contributions to the field of optical systems and sensor technology. With a total of 6 patents to his name, Eble's work showcases his expertise and innovative spirit.
Latest Patents
One of his latest patents is a method of manufacturing an optical system that includes forming a plurality of diaphragm apertures from a screening element. This method involves a beam deflection unit, diaphragm element, and a holder that maintains a predefined arrangement of these components. The processing light beams are directed through the beam deflection element, impacting the optical properties of the screening element.
Another significant invention is an optoelectronic sensor system designed for detecting objects within a monitored zone. This system features a light transmitter and receiver, with an objective arrangement that allows for selective deflection of the received light path. The innovative design enhances the efficiency of object detection in various applications.
Career Highlights
Johannes Eble has established himself as a key figure in his field through his inventive work at Sick AG. His contributions have advanced the capabilities of optical and sensor technologies, making a lasting impact on the industry.
Collaborations
Eble has collaborated with notable colleagues such as Sebastian Matt and Gerhard Alt. Their combined expertise has fostered a creative environment that encourages innovation and development.
Conclusion
Johannes Eble's work exemplifies the spirit of innovation in the realm of optical systems and sensor technology. His patents reflect a commitment to advancing technology and improving functionality in practical applications.