The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 2021
Filed:
Nov. 11, 2019
Sick Ag, Waldkirch/Breisgau, DE;
Johannes Eble, Waldkirch, DE;
Matthias Opfolter, Denzlingen, DE;
SICK AG, Waldkirch/Breisgau, DE;
Abstract
In a method of manufacturing an optical system that comprises at least one beam deflection unit, at least one diaphragm element, and at least one holder for fixing the beam deflection element and the diaphragm element in a predefined arrangement relative to one another, the beam deflection element and a screening element are provided. The beam deflection element and the screening element are fixed by means of the holder such that the actual arrangement of the screening element relative to the beam deflection element corresponds to the predefined arrangement of the diaphragm element relative to the beam deflection element. The beam deflection element is irradiated by the processing light beams such that after a deflection by the beam deflection element the processing light beams are incident on a functional zone of the screening element and change its optical properties by energy emission.