This inventor holds 1 USPTO granted patent. Top assignee: Infineon Technologies Ag. Active years: 2005.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2005
Title: Johann Steinmetz: Innovator in Trench Capacitor Technology
Introduction
Johann Steinmetz is a notable inventor based in Königsbrunn, Germany. He has made significant contributions to the field of semiconductor technology, particularly in the fabrication of trench capacitors. His innovative approach has led to the development of a unique method that enhances the efficiency and performance of these essential components.
Latest Patents
Steinmetz holds a patent for a "Method for fabricating a trench capacitor with an insulation collar." This method involves creating a trench capacitor in a substrate, which is electrically connected to the substrate on one side via a buried contact. The process utilizes a hard mask with a corresponding mask opening, showcasing his expertise in semiconductor fabrication techniques. He has 1 patent to his name.
Career Highlights
Johann Steinmetz is currently employed at Infineon Technologies AG, a leading company in semiconductor solutions. His work at Infineon has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in the industry. His dedication to research and development has positioned him as a valuable asset to his team.
Collaborations
Steinmetz collaborates with talented colleagues, including Lars Heineck and Stephan Kudelka. Their combined expertise fosters a creative environment that drives innovation and enhances the development of new technologies.
Conclusion
Johann Steinmetz is a prominent figure in the field of semiconductor technology, with a focus on trench capacitor fabrication. His contributions through his patent and work at Infineon Technologies AG highlight his commitment to advancing the industry. His innovative methods continue to influence the future of semiconductor design and manufacturing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
