Joerg Pollack

Title: Joerg Pollack: Innovator in Vacuum Chamber Technology

Introduction

Joerg Pollack is a notable inventor based in Wilsdruff, Germany. He has made significant contributions to the field of vacuum chamber technology, particularly in the processing of substrates. His innovative approach has led to the development of a unique patent that enhances the efficiency and control of substrate processing.

Latest Patents

Joerg Pollack holds a patent for a "Vacuum chamber arrangement and method for processing a substrate." This invention features a vacuum chamber equipped with multiple processing regions and a sophisticated substrate holding arrangement. The design includes a first drive train with a rotatable substrate holder, a second drive train with a support arm, and additional drive trains for further substrate holders, all of which can be controlled independently. This innovative setup allows for precise manipulation of substrates during processing, improving overall efficiency.

Career Highlights

Pollack is currently employed at Von Ardenne Asset GmbH & Co. KG, where he continues to develop cutting-edge technologies in the field. His work has been instrumental in advancing the capabilities of vacuum chamber systems, making them more versatile and effective for various applications.

Collaborations

Throughout his career, Joerg Pollack has collaborated with esteemed colleagues such as Lutz Gottsmann and Georg Laimer. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Joerg Pollack's contributions to vacuum chamber technology exemplify the spirit of innovation in the field of substrate processing. His patent and ongoing work at Von Ardenne Asset GmbH & Co. KG highlight his commitment to advancing technology and improving industrial processes.