Joerg Lichtenthaeler

Title: Joerg Lichtenthaeler: Innovator in Illumination Systems

Introduction

Joerg Lichtenthaeler is a prominent inventor based in Aalen, Germany. He has made significant contributions to the field of illumination systems, particularly in the context of extreme ultraviolet (EUV) technology. With a total of 2 patents to his name, Lichtenthaeler's work is recognized for its innovative approach and technical excellence.

Latest Patents

Lichtenthaeler's latest patents include a method for producing an illumination system for an EUV projection exposure system. This patent outlines a novel approach to creating an illumination system specifically designed for EUV apparatuses. The second patent also focuses on the illumination system for an EUV apparatus, emphasizing the importance of effective illumination in advanced lithography processes.

Career Highlights

Joerg Lichtenthaeler is currently employed at Carl Zeiss SMT GmbH, a leading company in the field of optical systems and lithography equipment. His role at the company allows him to work on cutting-edge technologies that are essential for the semiconductor industry. Lichtenthaeler's expertise in illumination systems has positioned him as a key player in the development of next-generation EUV technologies.

Collaborations

Throughout his career, Lichtenthaeler has collaborated with notable colleagues, including Juergen Baier and Daniel Runde. These collaborations have fostered an environment of innovation and have contributed to the advancement of illumination systems in the EUV domain.

Conclusion

Joerg Lichtenthaeler's contributions to the field of illumination systems, particularly in EUV technology, highlight his role as an influential inventor. His patents and work at Carl Zeiss SMT GmbH demonstrate his commitment to advancing optical technologies. Through his innovative approaches, Lichtenthaeler continues to shape the future of lithography and semiconductor manufacturing.