Guilderland, NY, United States of America

Jodi Lynn Reeves


Average Co-Inventor Count = 2.7

ph-index = 2

Forward Citations = 16(Granted Patents)


Location History:

  • Schenectady, NY (US) (2006 - 2010)
  • Guilderland, NY (US) (2010 - 2014)

Company Filing History:


Years Active: 2006-2014

Loading Chart...
4 patents (USPTO):Explore Patents

Title: The Inventive Journey of Jodi Lynn Reeves

Introduction: Jodi Lynn Reeves, a prolific inventor based in Guilderland, NY, has made significant contributions to the field of superconductors and tape manufacturing. With four patents to his name, Reeves continues to push the boundaries of innovation in his specialized areas of expertise.

Latest Patents: Reeves' latest patents showcase his expertise in the field of superconductors and X-ray diffraction methods. One patent focuses on innovative methods for forming superconductive articles, utilizing x-ray diffraction for robust characterization of substrates, buffer layers, and superconductor layers. Another patent highlights a tape manufacturing system with a tape-surface-inspection unit, capable of continuously characterizing the surface of non-transparent tapes.

Career Highlights: Reeves has honed his skills and expertise while working with industry-leading companies such as Superpower, Inc. and X-ray Optical Systems Incorporated. His innovative approach to problem-solving and attention to detail have been instrumental in driving forward technological advancements in the field.

Collaborations: Throughout his career, Reeves has collaborated with talented individuals such as Yunfei Qiao and David M Gibson. These collaborations have led to the development of groundbreaking technologies and solutions, further cementing Reeves' reputation as a skilled inventor and collaborator.

Conclusion: Jodi Lynn Reeves' contributions to the fields of superconductors and tape manufacturing have left a lasting impact on the industry. His inventive spirit, coupled with his dedication to pushing the boundaries of innovation, continues to inspire future generations of inventors and researchers in the pursuit of technological excellence.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…