The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 2010
Filed:
Jul. 16, 2004
David M. Gibson, Voorheesville, NY (US);
Walter M. Gibson, Voorheesville, NY (US);
Huapeng Huang, Latham, NY (US);
Jodi Lynn Reeves, Schenectady, NY (US);
David M. Gibson, Voorheesville, NY (US);
Walter M. Gibson, Voorheesville, NY (US);
Huapeng Huang, Latham, NY (US);
Jodi Lynn Reeves, Schenectady, NY (US);
X-Ray Optical Systems, Inc., East Greenbush, NY (US);
Superpower, Inc., Schenectady, NY (US);
Abstract
An x-ray diffraction measurement apparatus for measuring a sample, having an x-ray source and detector coupled together in a combination for coordinated rotation around the sample, such that x-ray diffraction data can be taken at multiple phi angles. The apparatus may provide a pole figure representation of crystal orientation of the sample, wherein the pole figure represents the crystal alignment, and a full width half maximum value is calculated from the pole figure for crystal alignment quantification. Data may be taken at discrete positions along a length of the sample, and the sample is in a fixed position during measuring; or data may be taken continuously along a length of the article, as the sample continuously moves along its length in a movement path between the source and detector. The sample may be in the form of a tape, linearly passing through a measurement zone.