Radebeul, Germany

Jochen Klais

This inventor holds 1 USPTO granted patent. Top assignee: Advanced Micro Devices Corporation. Active years: 2009.


% Patents Active = 100.0

Average Co-Inventor Count = 10.0

ph-index = 1

Forward Citations = 503(Granted Patents)


Company Filing History:


Years Active: 2009

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Jochen Klais: Innovator in Semiconductor Technology

Introduction

Jochen Klais is a notable inventor based in Radebeul, Germany. He has made significant contributions to the field of semiconductor technology, particularly in the area of patterning silicon nitride layers. His innovative approach has led to advancements that enhance the performance of semiconductor devices.

Latest Patents

Jochen Klais holds a patent titled "Method for reducing resist poisoning during patterning of silicon nitride layers in a semiconductor device." This patent focuses on performing a plasma treatment to efficiently seal the surface of a stressed dielectric layer containing silicon nitride. By doing so, it significantly reduces nitrogen-induced resist poisoning during the selective patterning of stressed layers with different types of intrinsic stress. This innovation is crucial for improving the reliability and efficiency of semiconductor manufacturing processes.

Career Highlights

Throughout his career, Jochen Klais has been associated with Advanced Micro Devices Corporation, a leading company in the semiconductor industry. His work has been instrumental in developing technologies that push the boundaries of what is possible in semiconductor design and fabrication.

Collaborations

Jochen has collaborated with several talented individuals in his field, including Ralf Richter and Matthias Schaller. These collaborations have fostered an environment of innovation and have contributed to the success of various projects within the semiconductor sector.

Conclusion

Jochen Klais is a prominent figure in semiconductor innovation, with a focus on enhancing the performance of silicon nitride layers. His contributions through patents and collaborations continue to shape the future of semiconductor technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to [email protected]
Loading…