This inventor holds 2 USPTO granted patents and 6 published patent applications and 2 EPO patents. Top assignee: Molecular Plasma Group Sa. Active years: 2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2025
Title: Joanna Borek-Donten: Innovator in Plasma Coating Technology
Introduction
Joanna Borek-Donten is a notable inventor based in Arlon, Belgium. She has made significant contributions to the field of plasma coating technology, particularly with her innovative approach to atmospheric pressure plasma jet coating deposition.
Latest Patents
Joanna holds a patent for a "Shield for atmospheric pressure plasma jet coating deposition on a substrate." This invention involves a plasma coating process that includes several steps. It features a replaceable shield with a jet inlet, a nozzle outlet, and a sidewall. The shield is detachably attached to a plasma jet generator, allowing for precise plasma coating of objects. The process ensures that the object profile fits closely to the nozzle outlet edge, maintaining a specific distance for optimal coating. The plasma coating is performed using low-temperature, oxygen-free plasma at an operating pressure higher than atmospheric pressure.
Career Highlights
Throughout her career, Joanna has worked with various companies, including Molecular Plasma Group SA and Heineken Supply Chain B.V. Her experience in these organizations has contributed to her expertise in plasma technology and innovation.
Collaborations
Joanna has collaborated with notable professionals in her field, including Gill Scheltjens and Bertrand Schons. These collaborations have further enhanced her work and contributions to plasma coating technology.
Conclusion
Joanna Borek-Donten is a pioneering inventor whose work in plasma coating technology has the potential to impact various industries. Her innovative patent and collaborative efforts highlight her significant role in advancing this field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile