The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 23, 2025

Filed:

Jan. 07, 2021
Applicant:

Molecular Plasma Group S.a., Foetz, LU;

Inventors:

Gill Scheltjens, Boom, BE;

Joanna Borek-Donten, Arlon, BE;

Régis Heyberger, Thionville, FR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 1/00 (2006.01); B05D 3/14 (2006.01); B29C 70/68 (2006.01); C09J 5/02 (2006.01); D06M 10/02 (2006.01); D06M 14/30 (2006.01); D06M 15/693 (2006.01); D06M 101/32 (2006.01); D06M 101/36 (2006.01);
U.S. Cl.
CPC ...
C09J 5/02 (2013.01); B05D 1/62 (2013.01); B05D 3/142 (2013.01); B29C 70/683 (2013.01); D06M 10/025 (2013.01); D06M 14/30 (2013.01); D06M 15/693 (2013.01); B05D 2201/00 (2013.01); B05D 2256/00 (2013.01); C09J 2475/00 (2013.01); D06M 2101/32 (2013.01); D06M 2101/36 (2013.01);
Abstract

A method for altering adhesion properties of a surface of a substrate by a coating, comprising the steps of: a) ionizing a plasma gas at low temperature and at atmospheric pressure, thereby creating a plasma with a plasma temperature of at most 50° C.; b) introducing a precursor into a plasma gas afterglow of the plasma; c) subjecting the surface of the substrate to the plasma including the precursor, thereby forming a coating onto the surface. The plasma gas is essentially completely comprised of inert gas. The coating alters the adhesion properties of the surface.


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