Cambridge, MA, United States of America

Jiye Lee

This inventor holds 1 USPTO granted patent. Top assignee: Palo Alto Research Center Inc.. Active years: 2017.


Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Jiye Lee - Innovator in Micro and Nano-Scale Textures

Introduction

Jiye Lee is a prominent inventor based in Cambridge, MA, known for his innovative contributions to the field of micro and nano-scale technologies. His work focuses on developing mechanical methods that enhance the production of nanostructures, particularly in the context of renewable energy applications.

Latest Patents

Jiye Lee holds a patent for a mechanical method for producing micro- or nano-scale textures. This invention facilitates the cost-effective production of nanostructures on large-scale substrates, which is crucial for the large-scale production of thin-film solar cells. The patented method involves a 'scratcher' mechanism that maintains precise positioning relative to a target substrate. This allows for the creation of micron-level features that define elongated parallel nano-scale grooves and ridges in the surface material layer.

Career Highlights

Jiye Lee is currently associated with the Palo Alto Research Center Inc., where he continues to push the boundaries of innovation in his field. His work has significant implications for the advancement of solar technology and other applications requiring precise micro and nano-scale features.

Collaborations

Some of Jiye Lee's notable coworkers include Sourobh Raychaudhuri and Matthew Dixon Eisaman. Their collaborative efforts contribute to the ongoing research and development in micro and nano-scale technologies.

Conclusion

Jiye Lee's innovative work in mechanical methods for producing micro and nano-scale textures positions him as a key figure in advancing technology for renewable energy applications. His contributions are paving the way for more efficient production methods in the industry.

Profile summary based on public USPTO records.
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