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Years Active: 2025
Title: Jiwan Koo: Innovator in Semiconductor Technology
Introduction
Jiwan Koo is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of semiconductor devices, showcasing his expertise and innovative spirit.
Latest Patents
Jiwan Koo holds a patent for a semiconductor device that includes a channel on a substrate. This channel is composed of a 2-dimensional material. A gate insulating layer is positioned on a first portion of the channel, with a gate electrode placed on a portion of the gate insulating layer. Additionally, first and second contact patterns are located on second portions of the channel, respectively. Each of these contact patterns incorporates a 2-dimensional material that contains an intercalation material. The device also features first and second source/drain electrodes on the respective contact patterns, with each electrode made of metal. This innovative design enhances the functionality and efficiency of semiconductor devices.
Career Highlights
Throughout his career, Jiwan Koo has worked with notable organizations, including Samsung Electronics and Sungkyunkwan University. His experience in these esteemed institutions has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.
Collaborations
Jiwan Koo has collaborated with talented individuals such as Jinhong Park and Maksim Andreev. These partnerships have fostered a creative environment that encourages innovation and the development of new technologies.
Conclusion
Jiwan Koo's contributions to semiconductor technology exemplify his dedication to innovation and excellence. His patent and collaborations highlight his role as a key figure in advancing the field.