Chungcheongnam-do, South Korea

Jisu Hong

This inventor holds 2 USPTO granted patents. Top assignee: Semes Co., Ltd.. Active years: 2023-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jisu Hong. Retrieved from https://idiyas.com/inventor/jisu-hong-gfo5tdwo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2023-2025

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2 patents (USPTO):Explore Patents

Title: Jisu Hong: Innovator in Substrate Treatment Technologies

Introduction

Jisu Hong is a notable inventor based in Chungcheongnam-do, South Korea. He has made significant contributions to the field of substrate treatment, holding 2 patents that showcase his innovative approaches.

Latest Patents

One of Jisu Hong's latest patents is an "Apparatus and method for treating substrate." This inventive concept provides a comprehensive solution for removing films formed on substrates. The method includes a primary solvent dispensing step, where an organic solvent is dispensed onto the substrate to eliminate a photoresist film. Following this, an ozone dispensing step is implemented, where a liquid containing ozone is applied to remove any organic residue remaining on the substrate.

Career Highlights

Jisu Hong is currently employed at Semes Co., Ltd., where he continues to develop and refine his innovative technologies. His work focuses on enhancing the efficiency and effectiveness of substrate treatment processes.

Collaborations

Throughout his career, Jisu has collaborated with talented individuals such as Sun Mi Kim and Moonsik Choi. These partnerships have contributed to the advancement of his projects and the successful implementation of his inventions.

Conclusion

Jisu Hong is a prominent figure in the field of substrate treatment, with a strong portfolio of patents and a commitment to innovation. His work at Semes Co., Ltd. and collaborations with colleagues highlight his dedication to advancing technology in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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