Location History:
- Haibara-gun, JP (2013)
- Shizuoka, JP (2011 - 2014)
Company Filing History:
Years Active: 2011-2014
Title: Jiro Yokoyama: Innovator in Resist Composition Technology
Introduction
Jiro Yokoyama is a prominent inventor based in Shizuoka, Japan. He has made significant contributions to the field of resist compositions, particularly in the context of pattern formation methods. With a total of 4 patents to his name, Yokoyama's work has had a notable impact on the industry.
Latest Patents
Yokoyama's latest patents include innovative technologies that enhance the efficiency and effectiveness of resist compositions. One of his patents focuses on a resist composition and a pattern forming method using the same. This resist composition includes a resin that decomposes under acid action, increasing its solubility in an alkali developer. Another significant patent involves an actinic ray-sensitive or radiation-sensitive resin composition. This composition contains a resin that becomes soluble in an alkali developer when acted upon by an acid, along with a compound that generates a fluorine-containing acid upon irradiation.
Career Highlights
Jiro Yokoyama has built a successful career at Fujifilm Corporation, where he has been instrumental in advancing resist composition technologies. His expertise in this area has led to the development of innovative solutions that are widely used in various applications.
Collaborations
Throughout his career, Yokoyama has collaborated with notable colleagues, including Kazuyoshi Mizutani and Shinichi Sugiyama. These collaborations have fostered a creative environment that has contributed to the success of their projects.
Conclusion
Jiro Yokoyama's contributions to resist composition technology exemplify his innovative spirit and dedication to advancing the field. His patents continue to influence the industry, showcasing the importance of research and development in creating effective solutions.