The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 08, 2013
Filed:
Sep. 30, 2010
Kana Fujii, Haibara-gun, JP;
Takamitsu Tomiga, Haibara-gun, JP;
Toru Tsuchihashi, Haibara-gun, JP;
Kazuyoshi Mizutani, Haibara-gun, JP;
Jiro Yokoyama, Haibara-gun, JP;
Shinichi Sugiyama, Haibara-gun, JP;
Shuji Hirano, Haibara-gun, JP;
Toru Fujimori, Haibara-gun, JP;
Kana Fujii, Haibara-gun, JP;
Takamitsu Tomiga, Haibara-gun, JP;
Toru Tsuchihashi, Haibara-gun, JP;
Kazuyoshi Mizutani, Haibara-gun, JP;
Jiro Yokoyama, Haibara-gun, JP;
Shinichi Sugiyama, Haibara-gun, JP;
Shuji Hirano, Haibara-gun, JP;
Toru Fujimori, Haibara-gun, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
According to one embodiment, an actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin containing the repeating units of formulae (I), (II) and (III) that when acted on by an acid, becomes soluble in an alkali developer, and (B) a compound that when irradiated with actinic rays or radiation, generates a fluorine-containing acid, wherein each of Rindependently represents a hydrogen atom or an optionally substituted methyl group, Rrepresents a halogen atom, an optionally substituted alkyl group, an optionally substituted cycloalkyl group, an optionally substituted aryl group or an optionally substituted aralkyl group, and n is an integer of 0 to 5, provided that when n is 2 or greater, multiple Rs may be identical to or different from each other.