The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2011
Filed:
Aug. 01, 2008
Toru Tsuchihashi, Shizuoka, JP;
Kazuyoshi Mizutani, Shizuoka, JP;
Shuji Hirano, Shizuoka, JP;
Jiro Yokoyama, Shizuoka, JP;
Shinichi Sugiyama, Shizuoka, JP;
Toru Tsuchihashi, Shizuoka, JP;
Kazuyoshi Mizutani, Shizuoka, JP;
Shuji Hirano, Shizuoka, JP;
Jiro Yokoyama, Shizuoka, JP;
Shinichi Sugiyama, Shizuoka, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
A positive resist composition comprising (A) a resin which contains all of the repeating units represented by formulae (I) to (III), and becomes soluble in an alkali developer by the action of an acid, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and a pattern forming method using the composition. A represents a group capable of decomposing and leaving by the action of an acid, each Rindependently represents hydrogen or a methyl group, Rrepresents a phenyl group or a cyclohexyl group, m represents 1 or 2, and n represents an integer of 0 to 2. By virtue of this construction, a resist composition ensuring high resolution, good pattern profile, sufficient depth of focus, little defects after development, and sufficiently high plasma etching resistance is provided.