Fuji, Japan

Jiro Sato

This inventor holds 2 USPTO granted patents. Top assignee: Asahi Kasei Kogyo Kabushiki Kaisha. Active years: 1987-1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jiro Sato. Retrieved from https://idiyas.com/inventor/jiro-sato-hwf6phva

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 24(Granted Patents)


Company Filing History:


Years Active: 1987-1994

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2 patents (USPTO):Explore Patents

Title: Jiro Sato: Innovator in Printed Circuit Board Technology

Introduction

Jiro Sato is a prominent inventor based in Fuji, Japan. He has made significant contributions to the field of printed circuit board technology. With a total of 2 patents, Sato continues to push the boundaries of innovation in his industry.

Latest Patents

Sato's latest patents include a method for producing printed circuit boards using photocurable resin. This method involves a laminate comprising a support and a photocurable resin layer. The photocurable resin layer contains a binder made of vinyl polymer or vinyl copolymer, along with a monomeric component that includes photopolymerizable unsaturated compounds. Additionally, the layer incorporates a photopolymerization initiator to enhance the curing process.

Career Highlights

Jiro Sato is currently employed at Asahi Kasei Kogyo Kabushiki Kaisha, where he applies his expertise in developing advanced technologies. His work has been instrumental in improving the efficiency and effectiveness of printed circuit board production.

Collaborations

Sato has collaborated with notable coworkers, including Hideki Matsuda and Toru Mori. Their combined efforts have contributed to the advancement of innovative solutions in the field.

Conclusion

Jiro Sato's contributions to printed circuit board technology exemplify his dedication to innovation. His patents reflect a commitment to enhancing manufacturing processes and improving product quality.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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