This inventor holds 3 USPTO granted patents. Top assignee: Fujitsu Corporation. Active years: 1981-1984.
Location History:
- Yamanishi, JP (1981)
- Kanagawa, JP (1984)
Company Filing History:
Years Active: 1981-1984
Title: Jiro Naito: Innovator in Resist Composition Technology
Introduction
Jiro Naito is a prominent inventor based in Kanagawa, Japan. He has made significant contributions to the field of resist compositions, holding a total of 3 patents. His work primarily focuses on developing innovative materials that enhance the efficiency and effectiveness of resist patterns in various applications.
Latest Patents
Naito's latest patents include a dry-developing positive resist composition and a dry-developing negative resist composition. The positive resist composition consists of a polymeric material containing unsaturated hydrocarbon bonds and a silicon compound, allowing for the formation of a positive resist pattern on a substrate through a specific process involving radiation exposure and gas plasma treatment. The negative resist composition, on the other hand, is made up of a polymer derived from specific monomers and a silicone compound, enabling the creation of a negative resist pattern through ionizing radiation and relief treatment.
Career Highlights
Jiro Naito is currently associated with Fujitsu Corporation, where he continues to innovate and develop advanced resist compositions. His expertise in this area has positioned him as a key figure in the field of materials science and technology.
Collaborations
Naito has collaborated with notable colleagues, including Yasuhiro Yoneda and Kenroh Kitamura, to further advance the research and development of resist technologies.
Conclusion
Jiro Naito's contributions to resist composition technology have made a significant impact in the field. His innovative patents and collaborations reflect his dedication to advancing materials science.