This inventor holds 2 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2010-2020.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Nirasaki, JP (2010)
- Yamanashi, JP (2020)
Company Filing History:
Years Active: 2010-2020
Title: Jiro Katsuki: Innovator in Substrate Processing Technologies
Introduction
Jiro Katsuki is a prominent inventor based in Yamanashi, Japan. He has made significant contributions to the field of substrate processing, holding a total of 2 patents. His innovative work focuses on methods and apparatuses that enhance the efficiency and effectiveness of semiconductor manufacturing processes.
Latest Patents
Katsuki's latest patents include a substrate processing method and a substrate processing apparatus. The substrate processing method is designed to remove an oxide film formed on the surface of a substrate. This method involves transforming the oxide film into a reaction by-product by supplying a halogen element-containing gas and a basic gas to the substrate in a processing chamber. The process continues by sublimating the reaction by-product to remove it from the substrate, repeating these steps multiple times for optimal results. Additionally, he has developed a method for measuring nitrogen concentration, a method for forming silicon oxynitride film, and a method for manufacturing semiconductor devices. These innovations are crucial for improving the quality and performance of semiconductor materials.
Career Highlights
Jiro Katsuki is currently employed at Tokyo Electron Limited, a leading company in the semiconductor industry. His work at this organization has allowed him to apply his inventive skills to real-world applications, contributing to advancements in technology and manufacturing processes.
Collaborations
Katsuki has collaborated with notable colleagues, including Hiroyuki Takahashi and Tomoaki Ogiwara. These partnerships have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.
Conclusion
Jiro Katsuki's contributions to substrate processing technologies exemplify the impact of innovation in the semiconductor industry. His patents and collaborative efforts continue to drive advancements in manufacturing processes, showcasing the importance of inventors in shaping the future of technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile