Jinn-Ann Kuo

Title: Jinn-Ann Kuo: Innovator in Integrated Capacitor Technology

Introduction

Jinn-Ann Kuo is a notable inventor based in Taipei Hsien, Taiwan. He has made significant contributions to the field of integrated capacitor technology. His innovative work has led to the development of a unique patent that enhances the performance of capacitors in electronic devices.

Latest Patents

Jinn-Ann Kuo holds a patent for an "Electrically polar integrated capacitor and method of making same." This invention features an integrated capacitor that includes a semiconductor substrate. A first vertical plate is laid over the semiconductor substrate, consisting of a plurality of first conductive slabs connected vertically using multiple first via plugs. Additionally, a second vertical plate is laid over the semiconductor substrate in parallel with the first vertical plate, which consists of a plurality of second conductive slabs connected vertically using multiple second via plugs. A conductive plate is laid under both vertical plates to shield them from producing a plate-to-substrate parasitic capacitance. The second vertical plate is electrically connected with the conductive plate using a third via plug. This innovative design aims to improve the efficiency and effectiveness of integrated capacitors.

Career Highlights

Jinn-Ann Kuo is currently associated with Acer Laboratories Inc., where he continues to push the boundaries of technology. His work has been instrumental in advancing the capabilities of electronic components, particularly in the realm of capacitors.

Collaborations

Throughout his career, Jinn-Ann has collaborated with talented individuals such as Man-Chun Hu and Wen-Chung Lin. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Jinn-Ann Kuo is a distinguished inventor whose work in integrated capacitor technology has made a significant impact in the field. His patent reflects a deep understanding of electronic components and their applications. His contributions continue to influence the development of advanced technologies in the industry.