Jinhyung Park

Title: Jinhyung Park: Innovator in Polishing Slurry Technology

Introduction

Jinhyung Park is a notable inventor based in Yongin-si, South Korea. He has made significant contributions to the field of polishing technology, particularly through his innovative patent related to polishing slurries. His work has implications for various industries, including electronics and materials science.

Latest Patents

Jinhyung Park holds a patent for a polishing slurry and method of polishing a substrate using this slurry. The patent describes a polishing slurry that includes an abrasive material, a first oxide polishing promoter, a first nitride polishing inhibitor, and a second nitride polishing inhibitor. The first oxide polishing promoter is a polymer-based oxide polishing promoter, while the first nitride polishing inhibitor is an anionic nitride polishing inhibitor. The second nitride polishing inhibitor consists of at least one selected from a cationic nitride polishing inhibitor and a non-ionic nitride polishing inhibitor. This innovative formulation enhances the efficiency and effectiveness of the polishing process.

Career Highlights

Throughout his career, Jinhyung Park has worked with prominent companies in the technology sector. Notably, he has been associated with Samsung Display Co., Ltd. and Ubmaterials Inc. His experience in these organizations has allowed him to develop and refine his expertise in polishing technologies.

Collaborations

Jinhyung Park has collaborated with talented individuals in his field, including Hyunjin Cho and Joonhwa Bae. These collaborations have contributed to the advancement of polishing technology and have fostered innovation in the industry.

Conclusion

Jinhyung Park is a distinguished inventor whose work in polishing slurry technology has made a significant impact. His innovative patent and collaborations with industry professionals highlight his contributions to the field. His ongoing efforts continue to shape advancements in polishing processes and materials.