Jingjing Tan

Title: Innovations of Inventor Jingjing Tan

Introduction

Jingjing Tan is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, holding a total of five patents. His work focuses on innovative semiconductor structures and their fabrication methods.

Latest Patents

One of his latest patents is a semiconductor structure that includes a substrate, a dielectric layer formed on the substrate, an opening through the dielectric layer, a contact layer at the bottom of the opening, a blocking layer on the sidewall surface of the opening, and a plug formed in the opening. The plug is in contact with the contact layer and is formed on the sidewall surface of the blocking layer. Another notable patent is related to a semiconductor structure and its fabrication method. This method involves providing a substrate and a first metal layer, forming a dielectric layer with a first opening, and bombarding the exposed portion of the first metal layer using a first sputtering treatment to create a first adhesion layer. Subsequently, a second metal layer is formed on the surface of the first adhesion layer.

Career Highlights

Jingjing Tan has worked with leading companies in the semiconductor industry, including Semiconductor Manufacturing International Corporation in Shanghai and Beijing. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor technology.

Collaborations

Throughout his career, Jingjing has collaborated with talented individuals such as Tiantian Zhang and Hao Kai Zhang. These collaborations have contributed to the advancement of his projects and innovations.

Conclusion

Jingjing Tan is a notable inventor whose work in semiconductor technology has led to several important patents. His contributions continue to influence the industry and pave the way for future innovations.