Jinghong H (John) Li

Title: The Innovative Contributions of Jinghong H (John) Li

Introduction

Jinghong H (John) Li is a notable inventor based in Poughquag, NY (US). He has made significant contributions to the field of semiconductor technology, particularly with his innovative patent related to high-K metal gate devices. His work has implications for the advancement of electronic devices and integrated circuits.

Latest Patents

One of Jinghong H (John) Li's key patents is for a high-K metal gate device. This device includes a substrate with a device region surrounded by an isolation region. The device region features edge portions along its width and a central portion. The gate layer, which is disposed on the substrate over the device region, has a graded thickness. The thickness at the edge portions differs from that at the central portion, enhancing the device's performance. This patent showcases his expertise and innovative approach in semiconductor design, with a total of 1 patent to his name.

Career Highlights

Throughout his career, Jinghong H (John) Li has worked with prominent companies in the technology sector. He has been associated with Globalfoundries Singapore Pte. Ltd. and IBM, where he contributed to various projects that pushed the boundaries of semiconductor technology. His experience in these leading firms has equipped him with the knowledge and skills necessary to innovate in his field.

Collaborations

Jinghong H (John) Li has collaborated with several talented individuals during his career. Notable coworkers include Young Way Teh and Michael Vincent Aquilino, who have also made significant contributions to the field of semiconductor technology.

Conclusion

Jinghong H (John) Li's work exemplifies the spirit of innovation in the semiconductor industry. His patent for a high-K metal gate device highlights his contributions to advancing technology. His collaborations and career experiences further underscore his impact on the field.