Company Filing History:
Years Active: 2014-2017
Title: **Innovations by Inventor Jing-Gang Li in Semiconductor Technology**
Introduction
Jing-Gang Li is a notable inventor based in Singapore, recognized for his contributions to semiconductor technology. His innovative approaches have led to the development of two significant patents that focus on methods for filling trenches with metal layers, a critical process in semiconductor fabrication.
Latest Patents
Jing-Gang Li's latest innovations include a patent titled "Method for filling trench with metal layer and semiconductor structure formed by using the same." This method involves a sophisticated deposition process utilizing a deposition apparatus with multiple supporting pins. The process begins with the placement of a substrate with a dielectric layer that features a trench. The inventive approach consists of a two-stage deposition process where the temperature of the substrate is gradually increased. This careful control of temperature allows for the effective filling of the trench with a metal layer. The semiconductor device produced through this method boasts an aluminum layer with a reflectivity greater than 1, enhancing its performance significantly.
Another of his patents is closely related, as it also addresses trench filling techniques and the resulting semiconductor structure featuring an aluminum layer with high reflectivity. Both patents underscore the importance of temperature control in the deposition process and showcase Jing-Gang Li's advanced understanding of semiconductor technology.
Career Highlights
Currently affiliated with United Microelectronics Corporation, Jing-Gang Li has established himself as a skilled inventor in the semiconductor industry. His work emphasizes innovation in materials and processes that significantly impact the efficiency and effectiveness of semiconductor devices.
Collaborations
In his career, Jing-Gang Li has collaborated with esteemed colleagues, including Chi-Mao Hsu and Hsin-Fu Huang. These partnerships foster an environment of creativity and technical expertise, which have contributed to their shared success in advancing semiconductor technologies.
Conclusion
Jing-Gang Li’s innovative contributions to semiconductor technology, encapsulated in his recent patents, reflect his dedication to advancing the field. His expertise in deposition processes and material properties continues to influence the development of effective semiconductor devices, marking him as a significant figure within the industry.