Jing Chang

Title: Jing Chang - Innovator in Semiconductor Manufacturing

Introduction

Jing Chang is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patent.

Latest Patents

Jing Chang holds a patent titled "Method and apparatus for coating photoresist over a substrate." This patent describes a method for manufacturing a semiconductor device that involves obtaining images of a fluid dispense nozzle using two cameras. The first camera captures a lower resolution image, while the second camera provides a higher resolution image. The method includes determining the width of the fluid dispense nozzle and the spray pattern of the fluid being dispensed at multiple intervals. By fitting a straight line to the data points representing these widths, the condition of the spray pattern and the fluid dispense nozzle can be assessed based on the slope of the line.

Career Highlights

Jing Chang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading organization in the semiconductor industry. His work focuses on enhancing the efficiency and precision of semiconductor device manufacturing.

Collaborations

Jing collaborates with talented colleagues, including Ching-Hai Yang and Wei-Hsiang Tseng, who contribute to the innovative environment at their workplace.

Conclusion

Jing Chang's contributions to semiconductor manufacturing through his patent demonstrate his expertise and commitment to innovation in the field. His work continues to influence advancements in technology and manufacturing processes.