Jin-Won Park

Title: Jin-Won Park: Innovator in Semiconductor Technology

Introduction

Jin-Won Park is a notable inventor based in Choongcheongbuk-Do, South Korea. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approaches to wiring and planarization methods in semiconductor devices.

Latest Patents

One of his latest patents is a "Planarization method for a semiconductor device." This method involves forming a planarization layer on a substrate, creating a first conductive line pattern, and subsequently forming an insulation layer. The process includes selectively exposing portions of the first conductive line pattern and forming a second conductive line pattern, ultimately leading to a passivation layer. The conductive lines of the first conductive line pattern are designed to have a width of less than approximately 2 μm.

Another significant patent is the "Method for fabricating wiring in a semiconductor device." This method focuses on self-alignment to form a conductor line and a contact hole. It includes steps such as forming an insulating layer, etching an etch-stop layer, and creating a mask layer. The process simplifies the fabrication while enhancing reliability through a single photolithography step.

Career Highlights

Jin-Won Park is currently employed at LG Semicon Co., Ltd., where he continues to advance semiconductor technologies. His work has been instrumental in improving the reliability and efficiency of semiconductor devices.

Collaborations

He collaborates with talented coworkers, including Young Kwon Jun and Yong Kwon Kim, who contribute to his innovative projects and research endeavors.

Conclusion

Jin-Won Park's contributions to semiconductor technology through his patents and work at LG Semicon Co., Ltd. highlight his role as a key innovator in the field. His methods not only simplify processes but also enhance the reliability of semiconductor devices.