This inventor holds 1 USPTO granted patent. Top assignees: Chongqing Institute of East China Normal University, East China Normal University, University of Shanghai for Science and Technology. Active years: 2023.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:

Years Active: 2023
Title: Jin Wang - Innovator in Stealth Dicing Technology
Introduction
Jin Wang is a notable inventor based in Chongqing, China. He has made significant contributions to the field of material processing, particularly through his innovative stealth dicing method. His work has implications for various industries, including electronics and materials science.
Latest Patents
Jin Wang holds a patent for a "Stealth dicing method including filamentation and apparatus thereof." This patent describes a method where a focusing element directs a laser beam onto the surface of the material to be diced. The process involves creating a dynamic-equilibrium plasma channel within the material, achieved through the self-focusing and defocusing effects of plasma generated by ionizing the material. This technique allows for the formation of a modified layer throughout the plasma channel, enabling stealth dicing.
Career Highlights
Throughout his career, Jin Wang has worked at reputable institutions, including the Chongqing Institute of East China Normal University and East China Normal University. His research and development efforts have focused on advancing techniques in material processing and laser applications.
Collaborations
Jin Wang has collaborated with several professionals in his field, including Heping Zeng and Shuai Yuan, who is a woman. These collaborations have contributed to the advancement of his research and the successful development of his patented technologies.
Conclusion
Jin Wang's innovative work in stealth dicing technology showcases his expertise and commitment to advancing material processing techniques. His contributions are valuable to the ongoing development of efficient and precise manufacturing methods.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile