This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Versarien Plc. Active years: 2023.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2023
Title: Jin Sung Park: Innovator in Graphene Quality Inspection
Introduction
Jin Sung Park is a notable inventor based in Changwon-si, South Korea. He has made significant contributions to the field of materials science, particularly in the inspection of graphene quality. His innovative approach has the potential to enhance the production and application of graphene in various industries.
Latest Patents
Jin Sung Park holds a patent for a "Method and system for inspecting growth quality of graphene." This patent describes a method for assessing the growth quality of a graphene layer on copper foil, which is achieved through chemical vapor deposition (CVD). The method involves reacting oxygen or water molecules with the copper foil layer via defect portions of the graphene layer. It includes partitioning the graphene-grown copper foil into partial regions, obtaining images of these regions, detecting oxidized areas, and determining the ratio of the graphene defect region to the total area of each image. This innovative technique is crucial for ensuring the integrity and performance of graphene materials.
Career Highlights
Jin Sung Park is currently associated with Versarien Plc, a company known for its advancements in graphene technology. His work at Versarien Plc focuses on improving the quality and application of graphene, which is a material with immense potential in various sectors, including electronics, energy, and materials engineering.
Collaborations
Jin Sung Park collaborates with Jin Ho Jang, contributing to the advancement of graphene research and development. Their combined expertise enhances the innovative capabilities of their projects.
Conclusion
Jin Sung Park's contributions to graphene quality inspection represent a significant advancement in materials science. His innovative methods and dedication to research continue to pave the way for future developments in graphene technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile