Yongin, South Korea

Jin-na Namgoong

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jin-na Namgoong. Retrieved from https://idiyas.com/inventor/jin-na-namgoong

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2011

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Jin-na Namgoong: Innovator in Optical Scanner Technology

Introduction

Jin-na Namgoong is a notable inventor based in Yongin, South Korea. He has made significant contributions to the field of optical scanning technology. His innovative approach has led to the development of a unique calibration apparatus that enhances the functionality of optical scanners.

Latest Patents

Namgoong holds a patent for an "Apparatus for calibrating optical scanner, method of manufacturing the same, and method of calibrating optical scanner using the same." This patent describes a method of manufacturing a calibration apparatus for an optical scanner. The process involves reacting a substrate coated with a functional group and a molecule capable of forming an activated excimer to immobilize the molecule on the substrate. This invention is crucial for improving the accuracy and efficiency of optical scanning devices.

Career Highlights

Jin-na Namgoong is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to collaborate with other talented professionals in the field.

Collaborations

Some of his notable coworkers include Kyu-tae Yoo and Jeo-young Shim, who contribute to the innovative environment at Samsung Electronics.

Conclusion

Jin-na Namgoong's contributions to optical scanner technology exemplify the spirit of innovation. His patent and work at Samsung Electronics highlight the importance of advancements in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…