Jin-Myung Hwang

Title: Innovations of Jin-Myung Hwang

Introduction

Jin-Myung Hwang is a notable inventor based in Changwon-si, South Korea. He has made significant contributions to the field of semiconductor manufacturing through his innovative patents. With a total of 2 patents, Hwang's work focuses on enhancing the efficiency and effectiveness of polishing compositions used in semiconductor devices.

Latest Patents

Hwang's latest patents include a polishing composition and methods of manufacturing semiconductor devices using the same. This polishing composition comprises abrasive particles, a pyrrolidone containing a hydrophilic group, a dispersing agent, a first dishing inhibitor including polyacrylic acid, and a second dishing inhibitor including a non-ionic polymer. Additionally, he has developed a slurry composition for chemical mechanical polishing, which includes ceramic polishing particles, a dispersion agent, a pH control agent, and an additive that has affinity with silicon nitride.

Career Highlights

Throughout his career, Jin-Myung Hwang has worked with prominent companies in the technology sector, including Samsung Electronics Co., Ltd. and K. C. Tech Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to advancements in semiconductor technology.

Collaborations

Hwang has collaborated with several talented individuals in his field, including Seung-Ho Park and Ki-Hwa Jung. These collaborations have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Jin-Myung Hwang's contributions to the semiconductor industry through his patents and collaborations highlight his role as a key innovator. His work continues to influence the field and drive advancements in technology.