Company Filing History:
Years Active: 2005-2006
Title: **Innovative Contributions of Inventor Jin Liu in Wafer Polishing Technology**
Introduction
Jin Liu is a notable inventor based in Albuquerque, NM, recognized for his contributions to the field of wafer polishing technology. With an impressive portfolio of two patents, Jin's work significantly enhances the precision and efficiency of wafer polishing processes. His latest innovation is particularly noteworthy, reflecting his commitment to advancing technological capabilities in this area.
Latest Patents
Jin Liu's latest patent, titled "Rinse apparatus and method for wafer polisher," introduces an innovative apparatus designed for polishing wafers. This apparatus comprises a rotatable polishing pad centered around a specific rotation point, paired with a rinse delivery conduit that is strategically positioned adjacent to the polishing pad. The design includes a series of nozzles that dispense rinsing liquid, with an inventive configuration aimed at optimizing the flow rate. Notably, the nozzles are designed to generate a higher flow of rinsing liquid at the proximal end of the conduit, which is close to the center, compared to the flow at the distal end. This thoughtful engineering enhances the efficiency of the rinsing process during wafer polishing.
Career Highlights
Currently, Jin Liu is associated with Intel Corporation, a leading company in technology and semiconductor innovation. His role at Intel allows him to engage in cutting-edge research and development, constantly pushing the boundaries of wafer polishing technology.
Collaborations
Throughout his career, Jin has collaborated with esteemed colleagues like Lei Jiang and Sadasivan Shankar. These partnerships have fostered a collaborative environment that promotes the development of innovative solutions in the tech field.
Conclusion
In summary, Jin Liu's inventive spirit and technological expertise have positioned him as a significant contributor to the field of wafer polishing. His latest patents, including the innovative rinse apparatus, demonstrate his dedication to enhancing efficiency in semiconductor manufacturing processes. The collaborative efforts with his coworkers further highlight the importance of teamwork in driving innovation in technology.