Jin Hee Hong

Title: Innovations of Jin Hee Hong in Substrate Processing

Introduction

Jin Hee Hong is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of substrate processing, particularly in the development of methods and apparatuses that enhance the efficiency and effectiveness of atomic layer etching.

Latest Patents

Jin Hee Hong holds 2 patents that showcase his innovative approaches. His latest patents include an "Apparatus and method for processing substrate," which describes a substrate processing method capable of stably performing atomic layer etching without damaging a process chamber. This method involves providing a substrate with a target layer in a chamber, forming a first plasma using a chlorine-containing gas to reform the target layer, and subsequently forming a second plasma with an oxygen-containing gas to further reform the target layer. The process allows for the removal of portions of the target layer through repeated cycles of plasma formation and precursor reaction. Another patent, "Substrate processing apparatus and substrate processing method," details a substrate processing apparatus that includes a processing chamber with a transparent window, a gas flow unit for supplying process gas, and a laser irradiator for selectively heating the substrate during atomic layer processing.

Career Highlights

Jin Hee Hong has established himself as a key figure in the substrate processing industry. His work at Semes Co., Ltd. has been instrumental in advancing technologies that improve substrate processing techniques. His innovative methods have the potential to significantly impact various applications in semiconductor manufacturing.

Collaborations

Jin Hee Hong has collaborated with notable colleagues, including Yun Sang Kim and Kwang Ryul Kim. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in substrate processing technologies.

Conclusion

Jin Hee Hong's contributions to substrate processing through his innovative patents and collaborative efforts highlight his importance in the field. His work continues to influence advancements in technology and manufacturing processes.