The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2025
Filed:
Dec. 29, 2022
Applicant:
Semes Co., Ltd., Chungcheongnam-do, KR;
Inventors:
Kwang Ryul Kim, Chungcheongnam-do, KR;
Yun Sang Kim, Chungcheongnam-do, KR;
Jin Hee Hong, Chungcheongnam-do, KR;
Assignee:
SEMES CO., LTD., Chungcheongnam-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/46 (2005.12); C23C 16/455 (2005.12); H01J 37/32 (2005.12);
U.S. Cl.
CPC ...
C23C 16/46 (2012.12); C23C 16/45544 (2012.12); H01J 37/3244 (2012.12); H01J 37/32458 (2012.12); H01J 37/32724 (2012.12); H01J 2237/332 (2012.12); H01J 2237/334 (2012.12);
Abstract
A substrate processing apparatus includes a processing chamber having a processing space in which a substrate is plasma-processed, and having a transparent window; a gas flow unit supplying and discharging process gas to the processing chamber; and a laser irradiator irradiating a laser for heating the substrate to be selectively atomic layer-processed for each of a plurality of thin films formed on the substrate through the transparent window from an external space of the processing chamber.