Jim Wiley is a notable inventor based in Menlo Park, California. He has made significant contributions to the field of microlithography, particularly through his innovative patent. With a focus on improving the fabrication processes of microlithographic patterns, Wiley's work has implications for the semiconductor industry.

Latest Patents

Wiley holds a patent titled "Qualifying patterns, patterning processes, or patterning apparatus in the fabrication of microlithographic patterns." This patent outlines methods that include acquiring aerial images of a reticle for different values of lithographic variables. One method involves determining the presence of anomalies in design patterns by comparing aerial images corresponding to various values. Another method assesses areas on the reticle that are most susceptible to failure during lithography processes. Additionally, the patent addresses transient repeating defects by subtracting non-transient defects from aerial images.

Career Highlights

Throughout his career, Jim Wiley has worked with prominent companies in the technology sector, including KLA-Tencor Technologies Corporation and KLA Tencor Corporation. His experience in these organizations has allowed him to refine his expertise in microlithography and contribute to advancements in the field.

Collaborations

Wiley has collaborated with several professionals in his field, including Ingrid B. Peterson and Mike Von Den Hoff. These collaborations have further enriched his work and expanded the impact of his innovations.

Conclusion

Jim Wiley's contributions to microlithography through his patent and career experiences highlight his role as an influential inventor in the technology sector. His work continues to shape the future of semiconductor fabrication processes.