Palo Alto, CA, United States of America

Jim Thompson

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jim Thompson. Retrieved from https://idiyas.com/inventor/jim-thompson-kczj6w3p

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 16(Granted Patents)


Company Filing History:


Years Active: 2003

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Jim Thompson - Innovator in Physical Vapor Deposition Technology

Introduction

Jim Thompson is a notable inventor based in Palo Alto, CA. He has made significant contributions to the field of physical vapor deposition technology. His innovative work focuses on reducing particle generation during magnetron sputtering processes.

Latest Patents

Jim Thompson holds a patent for a "Target sidewall design to reduce particle generation during magnetron sputtering." This invention includes an apparatus for a physical vapor deposition system, featuring a target with a sidewall that has an undercut defining a net erosion area and a net redeposition area. This design aims to enhance the efficiency and effectiveness of the sputtering process.

Career Highlights

Jim is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work at Applied Materials has allowed him to contribute to advancements in manufacturing technologies.

Collaborations

Jim has collaborated with talented individuals such as James Van Gogh and Karl M Brown. These partnerships have fostered innovation and creativity in their projects.

Conclusion

Jim Thompson's contributions to the field of physical vapor deposition technology exemplify his commitment to innovation. His patent and work at Applied Materials, Inc. highlight his role as a key figure in advancing manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…