Jim R Baugh

Title: Jim R Baugh: Innovator in Photomask Technology

Introduction

Jim R Baugh is a notable inventor based in Boise, ID (US), recognized for his contributions to photomask technology. With a total of two patents to his name, Baugh has made significant advancements in the field of semiconductor manufacturing.

Latest Patents

Baugh's latest patents include a method for adjusting dimensions of photomask features. This innovative method allows for the adjustment of one or more dimensions of a photomask after etching a defective pattern in the chrome-containing layer. The process involves subjecting the chrome-containing layer to a wet etch using a solution of deionized water and ozone. The exposure time is directly proportional to the desired degree of adjustment, enabling precise modifications ranging from a few angstroms to 20-30 nanometers or more.

Career Highlights

Jim R Baugh is currently employed at Micron Technology Incorporated, where he continues to develop and refine technologies that enhance semiconductor manufacturing processes. His work has contributed to the efficiency and accuracy of photomask production.

Collaborations

Baugh collaborates with Robert T Rasmussen, a fellow innovator in the field. Their combined expertise fosters an environment of innovation and progress within their organization.

Conclusion

Jim R Baugh's contributions to photomask technology exemplify the impact of innovation in the semiconductor industry. His patents reflect a commitment to advancing manufacturing techniques, ensuring that the industry continues to evolve and improve.