Jiin-Hong Lin

Title: Jiin-Hong Lin and Pellicle-Mounting Innovations

Introduction

Jiin-Hong Lin is an inventor based in Jhubei, Taiwan. Her patent work focuses on apparatuses and methods for mounting pellicles to photomasks in controlled environments. Lin is associated with Taiwan Semiconductor Manufacturing Company Limited and holds 2 patents.

Latest Patents

Lin’s listed patents address pellicle mounting for photomasks, a process relevant to semiconductor manufacturing.

“Pellicle Mounting Apparatus and Assembly with Pellicle Mounted on Mask” describes a chamber that can be filled with extreme clean dry air (XCDA) or an inert gas. A pellicle mounter inside the chamber holds the mask, which is irradiated with vacuum ultraviolet (VUV) light while surrounded by the controlled atmosphere. The pellicle is mounted while the mask remains exposed to VUV light in that environment. The patent also describes an assembly in which a pellicle frame is attached to the mask with pressure-sensitive adhesive, and a pellicle joins the frame to form a sealed enclosure filled with XCDA or inert gas.

“Pellicle Mounting Method and Apparatus” likewise describes a chamber, a pellicle mounter, and a VUV light source. The method irradiates the mask in an XCDA or inert-gas atmosphere and mounts the pellicle while the mask remains in that atmosphere and under VUV exposure.

Career Highlights

Lin’s listed inventions center on combining controlled gas environments with VUV irradiation during pellicle attachment. The patents describe equipment and procedures intended to support pellicle mounting as part of photomask handling in semiconductor production.

Collaborations

Lin is associated with Taiwan Semiconductor Manufacturing Company Limited. Her listed coworkers include Chih-Chen Chen and Ming-Tao Ho.

Conclusion

Jiin-Hong Lin’s patent portfolio highlights pellicle-mounting methods and apparatuses that use controlled atmospheres and VUV exposure in photomask processing.