Jihui Huang

Title: Jihui Huang: Innovator in Mask Image Technology

Introduction

Jihui Huang is a prominent inventor based in San Jose, California, known for his contributions to mask image technology. With a total of four patents to his name, Huang has made significant advancements in the field of semiconductor manufacturing.

Latest Patents

Huang's latest patents include innovative methods for biasing mask images and optimizing shapes for mask making. One of his patents, titled "Mask Bias Approximation," discloses a method that involves generating a mask image, biasing it to create a biased mask image, and simulating this image to obtain a wafer image for comparison with the design pattern. This process includes updating pixels based on interpolations of neighboring pixels, which are influenced by predetermined values. Another notable patent, "Application of FreeForm MRC to SRAF Optimization Based on ILT Mask Optimization," focuses on extracting shapes from a pixelated SRAF bitmap image. This method involves receiving a bitmap image, selecting ridge points based on brightness values, and determining mask shapes using arrival times derived from pixel brightness.

Career Highlights

Throughout his career, Jihui Huang has worked with leading companies in the semiconductor industry, including ASML US, Inc. and Xtal, Inc. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in mask image processing.

Collaborations

Huang has collaborated with notable colleagues such as Ke Zhao and Jiangwei Li, further enhancing his work in the field. Their combined expertise has led to advancements that benefit the semiconductor manufacturing process.

Conclusion

Jihui Huang's innovative work in mask image technology has positioned him as a key figure in the semiconductor industry. His patents reflect a commitment to improving manufacturing processes and advancing technology.