The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2020
Filed:
May. 15, 2018
Applicant:
Asml Us, Llc, Chandler, AZ (US);
Inventors:
Song Lan, San Jose, CA (US);
Ke Zhao, San Jose, CA (US);
Yang Cao, San Jose, CA (US);
Jihui Huang, San Jose, CA (US);
Assignee:
ASML US, LLC, Chandler, AZ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G03F 1/70 (2012.01); G03F 1/36 (2012.01); G03F 1/20 (2012.01); G06T 7/00 (2017.01);
U.S. Cl.
CPC ...
G03F 1/70 (2013.01); G03F 1/20 (2013.01); G03F 1/36 (2013.01); G06T 7/0006 (2013.01); G06T 2207/30148 (2013.01);
Abstract
Directly biasing a mask image is disclosed. A method includes generating a mask image for the mask, biasing the mask image to obtain a biased mask image, and simulating the biased mask image to obtain a wafer image to be compared to the design pattern. Biasing the mask image includes updating at least one pixel of the mask image using an interpolation of neighboring pixels of the at least one pixel, the interpolation being dependent on a predetermined value.