Company Filing History:
Years Active: 2020
Title: The Innovative Contributions of Song Lan
Introduction
Song Lan is a notable inventor based in San Jose, California. He has made significant contributions to the field of technology, particularly in the area of mask bias approximation. His work has implications for the semiconductor industry, where precision and accuracy are paramount.
Latest Patents
Song Lan holds a patent for a method titled "Mask bias approximation." This invention discloses a technique for directly biasing a mask image. The method involves generating a mask image, biasing it to create a biased mask image, and simulating this biased mask image to produce a wafer image for comparison with the design pattern. The biasing process includes updating at least one pixel of the mask image through interpolation of neighboring pixels, with the interpolation being dependent on a predetermined value.
Career Highlights
Song Lan is currently employed at ASML US, Inc., a leading company in the semiconductor equipment industry. His role involves leveraging his expertise to enhance the precision of photolithography processes, which are critical for the manufacturing of integrated circuits.
Collaborations
Throughout his career, Song has collaborated with talented individuals such as Ke Zhao and Yang Cao. These collaborations have fostered an environment of innovation and have contributed to the advancement of technology in their field.
Conclusion
Song Lan's contributions to the field of mask bias approximation exemplify the importance of innovation in technology. His work not only enhances manufacturing processes but also sets a foundation for future advancements in the semiconductor industry.