Ke Zhao

Title: The Innovative Contributions of Ke Zhao

Introduction

Ke Zhao is a prominent inventor based in San Jose, California. He has made significant contributions to the field of technology, particularly in the area of mask image processing. With a total of four patents to his name, Zhao's work has advanced the methodologies used in mask optimization and simulation.

Latest Patents

One of Zhao's latest patents is titled "Mask Bias Approximation." This invention discloses a method for directly biasing a mask image. The process involves generating a mask image, biasing it to create a biased mask image, and simulating this biased image to obtain a wafer image for comparison with the design pattern. The biasing technique includes updating at least one pixel of the mask image through interpolation of neighboring pixels, which is influenced by a predetermined value.

Another notable patent is "Application of FreeForm MRC to SRAF Optimization Based on ILT Mask Optimization." This invention focuses on extracting shapes from a pixelated SRAF bitmap image for mask making. The method includes receiving a pixelated bitmap image, selecting a ridge point based on brightness values, and determining mask shapes using arrival times derived from pixel brightness values and Mask Rule Check (MRC) rules.

Career Highlights

Throughout his career, Ke Zhao has worked with notable companies such as ASML US, Inc. and Xtal, Inc. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge technologies in the semiconductor industry.

Collaborations

Zhao has collaborated with talented individuals in his field, including Jihui Huang and Jiangwei Li. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Ke Zhao's contributions to mask image processing and optimization have made a significant impact in the technology sector. His innovative patents reflect his expertise and commitment to advancing the field.