St. Charles, MO, United States of America

Jihong (John) Chen


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2012-2015

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2 patents (USPTO):Explore Patents

Title: Jihong (John) Chen: Innovator in Directional Solidification Technology

Introduction

Jihong (John) Chen, based in St. Charles, MO, is a prominent inventor known for his contributions to the field of materials engineering, specifically in the area of directional solidification technologies. With a total of two patents credited to his name, Chen’s work has significant implications for the semiconductor industry.

Latest Patents

Jihong Chen’s latest patents focus on enhancing the purity of silicon used in various applications. His innovative design for a directional solidification furnace emphasizes two main elements: reducing melt contamination and minimizing wafer contamination. The furnace includes a specially designed crucible that holds molten silicon, covered by a lid that creates an enclosure to protect the molten material. An additional inlet in the lid allows for the introduction of inert gas above the molten silicon, serving to inhibit any potential contamination, which is crucial for semiconductor manufacturing.

Career Highlights

Throughout his career, Jihong Chen has made significant contributions at Memc Singapore Pte. Ltd., where he honed his expertise in semiconductor manufacturing processes. His innovative approaches and dedication to improving material integrity have positioned him as a valuable asset to the companies involved in high-tech and semiconductor industries.

Collaborations

During his tenure, Jihong collaborated with several professionals, including Steven Lawrence Kimbel and Richard G. Schrenker. These collaborations have likely fostered a productive exchange of ideas that further enhanced the technological advancements in which they were involved.

Conclusion

Jihong (John) Chen’s innovations in directional solidification technology are vital for the future of the semiconductor industry. With his patents addressing critical issues such as contamination during the silicon melting process, he has established himself as a key figure in advancing materials engineering. As technology continues to evolve, inventions like his will play an essential role in ensuring the performance and reliability of semiconductor devices.

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