Jih-Sheng Yang

Title: Jih-Sheng Yang: Innovator in Semiconductor Technology

Introduction

Jih-Sheng Yang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent work. His expertise and dedication have positioned him as a key figure in the industry.

Latest Patents

Jih-Sheng Yang holds a patent for a "Metal gate process and related structure." This patent describes a method of forming a semiconductor device that includes providing a device with a gate stack featuring a metal gate layer and a spacer layer on the sidewall of the gate stack. The method involves performing an etch-back process to the metal gate layer to create an opening over the gate stack. Additionally, it includes a plasma treatment process to modify the profile of the opening, and in some cases, forming a HM layer over the metal gate layer within the opening that has the modified profile. This innovative approach enhances the efficiency and performance of semiconductor devices.

Career Highlights

Jih-Sheng Yang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading organization in the semiconductor industry. His work at this esteemed company has allowed him to collaborate with other talented professionals and contribute to groundbreaking advancements in technology.

Collaborations

Some of his notable coworkers include Chih-Lun Lu and Chen-Wei Pan. Their collective expertise and teamwork have fostered an environment of innovation and excellence within the company.

Conclusion

Jih-Sheng Yang's contributions to semiconductor technology through his patent work and collaborations highlight his importance in the field. His innovative methods continue to influence the development of advanced semiconductor devices.