Shanghai, China

Jie Du

USPTO Granted Patents = 4 

 

Average Co-Inventor Count = 4.9

ph-index = 3

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2013-2024

Loading Chart...
Loading Chart...
4 patents (USPTO):Explore Patents

Title: Jie Du - Innovator in Plasma Processing and IT Management

Introduction

Jie Du is a prominent inventor based in Shanghai, China, known for his contributions to the fields of plasma processing and IT client management. With a total of 4 patents, he has made significant advancements that enhance the efficiency and functionality of various technologies.

Latest Patents

Jie Du's latest patents include a multi-zone heating apparatus, a bottom electrode assembly, a plasma processing apparatus, and a temperature adjusting method. The multi-zone heating apparatus features a plurality of foil heaters and switches that independently control the operating time of the connected foil heaters. This innovation can be integrated between the electrostatic chuck and the base in plasma processing apparatuses, reducing the need for external conductive wires and filters. Additionally, he has developed a method for relationship visualization and graphical interaction in IT client management, which allows for the display of hierarchical structures in a user-friendly graphical interface.

Career Highlights

Throughout his career, Jie Du has worked with notable companies such as Microsoft Technology Licensing, LLC and Advanced Micro-Fabrication Equipment Inc. China. His experience in these organizations has contributed to his expertise in developing cutting-edge technologies.

Collaborations

Jie Du has collaborated with talented individuals in his field, including Chuanbo Zhang and Huajun Luo. These partnerships have fostered innovation and the sharing of ideas, further enhancing his contributions to technology.

Conclusion

Jie Du's work exemplifies the spirit of innovation in the realms of plasma processing and IT management. His patents and career achievements reflect his dedication to advancing technology and improving efficiency in various applications.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…