Company Filing History:
Years Active: 2006
Title: Jiazhan Xu: Innovator in Thermal Imaging Technology
Introduction
Jiazhan Xu is a notable inventor based in Vernon, CT (US). He has made significant contributions to the field of thermal imaging, particularly in semiconductor process monitoring. His innovative approach has led to the development of a patented method that enhances the efficiency and accuracy of semiconductor fabrication processes.
Latest Patents
Jiazhan Xu holds a patent for a method titled "Thermal imaging for semiconductor process monitoring." This method measures the temperature, emissivity, and other properties of relatively smooth surfaces radiating thermal energy. It is specifically designed for monitoring semiconductor fabrication processes. The temperature is determined by relating measured radiance to the predictions of the Planck radiation law, utilizing knowledge of the emissivity derived from an analysis of the polarization of the thermally emitted radiance. Additionally, properties of thin films, such as thickness and composition, can be computed from the emissivity or the ratio of the emissivities measured at two independent polarizations. This innovative measurement technique allows for data collection from intrinsic thermal radiance, making it possible to perform measurements even when providing an external light source is inconvenient or impossible.
Career Highlights
Jiazhan Xu is currently employed at MKS Instruments, Inc., where he continues to develop and refine his thermal imaging technologies. His work has positioned him as a key player in the semiconductor industry, contributing to advancements that improve manufacturing processes.
Collaborations
Throughout his career, Jiazhan has collaborated with esteemed colleagues such as Peter Rosenthal and Sylvie Charpenay. These partnerships have fostered an environment of innovation and have led to further advancements in the field.
Conclusion
Jiazhan Xu's contributions to thermal imaging technology have made a significant impact on semiconductor process monitoring. His patented methods and ongoing work at MKS Instruments, Inc. highlight his role as an influential inventor in this critical field.