Jiawei Dong

Title: Jiawei Dong: Innovator in Plasma Processing Technology

Introduction

Jiawei Dong is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of a unique plasma processing apparatus that addresses critical challenges in the industry.

Latest Patents

Jiawei Dong holds 1 patent for his invention titled "Plasma Processing Apparatus." This apparatus includes a vacuum chamber and a plasma reactor designed for efficient plasma processing. It features an RF power source that provides RF signals to the plasma reactor, along with an RF power transmission unit that transmits these signals within the vacuum chamber. The design incorporates a transmission line and an outer conductor to shield the electromagnetic field, effectively preventing electric discharge during RF signal transmission. This innovation enhances safety and reduces transmission power loss.

Career Highlights

Jiawei Dong is associated with Ideal Energy (Shanghai) Sunflower Thin Film Equipment, Ltd. His work at this company has been instrumental in advancing plasma processing technologies. His expertise and innovative mindset have positioned him as a key player in the field.

Collaborations

Jiawei has collaborated with talented individuals such as Jinyuan Chen and Feiyun Yang. Their combined efforts have contributed to the success of various projects within the company.

Conclusion

Jiawei Dong's contributions to plasma processing technology exemplify his innovative spirit and dedication to advancing the field. His patent for the plasma processing apparatus showcases his ability to solve complex problems, making a significant impact in the industry.