The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2016
Filed:
Aug. 05, 2011
Jinyuan Chen, Shanghai, CN;
Jiawei Dong, Shanghai, CN;
Feiyun Yang, Shanghai, CN;
Lei Yu, Shanghai, CN;
Xiaohong Song, Shanghai, CN;
Jinyuan Chen, Shanghai, CN;
Jiawei Dong, Shanghai, CN;
Feiyun Yang, Shanghai, CN;
Lei Yu, Shanghai, CN;
Xiaohong Song, Shanghai, CN;
IDEAL ENERGY (SHANGHAI) SUNFLOWER THIN FILM EQUIPMENT, LTD., Shanghai, CN;
Abstract
The present invention provides a plasma processing apparatus. The apparatus includes a vacuum chamber, a plasma reactor arranged in the vacuum chamber for plasma processing, an RF power source for providing RF signals to the plasma reactor and an RF power transmission unit for transmitting RF signals from the RF power source to the plasma reactor inside the vacuum chamber. The RF power transmission unit includes a transmission line for transmitting RF signals and an outer conductor for shielding the electromagnetic field around the transmission line. The invention can effectively avoid the problem of electric discharge when RF signals transmit in a vacuum chamber, resulting in more security and less transmission power loss.