Feiyun Yang

Title: Feiyun Yang: Innovator in Plasma Processing Technology

Introduction

Feiyun Yang is a notable inventor based in Shanghai, China. He has made significant contributions to the field of plasma processing technology. His innovative approach has led to the development of a unique apparatus that enhances the efficiency and safety of plasma processing.

Latest Patents

Feiyun Yang holds a patent for a plasma processing apparatus. This invention includes a vacuum chamber and a plasma reactor designed for plasma processing. It features an RF power source that provides RF signals to the plasma reactor, along with an RF power transmission unit that transmits these signals within the vacuum chamber. The RF power transmission unit is equipped with a transmission line and an outer conductor that shields the electromagnetic field around the transmission line. This invention effectively addresses the issue of electric discharge during RF signal transmission in a vacuum chamber, resulting in improved safety and reduced transmission power loss.

Career Highlights

Feiyun Yang is associated with Ideal Energy (Shanghai) Sunflower Thin Film Equipment, Ltd. His work at this company has allowed him to focus on advancing plasma processing technologies. His innovative contributions have positioned him as a key figure in the industry.

Collaborations

Feiyun Yang has collaborated with talented individuals such as Jinyuan Chen and Jiawei Dong. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Feiyun Yang's contributions to plasma processing technology exemplify the spirit of innovation. His patent for a plasma processing apparatus showcases his commitment to enhancing safety and efficiency in the field. Through his work and collaborations, he continues to make a significant impact in the industry.